The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2017
Filed:
Jul. 30, 2012
Raymond Jacobus Wilhelmus Knaapen, Delft, NL;
Ruud Olieslagers, Delft, NL;
Dennis Van Den Berg, Delft, NL;
Matijs C. Van Den Boer, Delft, NL;
Diederik Jan Maas, Delft, NL;
Jacques Cor Johan Van Der Donck, Delft, NL;
Freddy Roozeboom, Delft, NL;
Raymond Jacobus Wilhelmus Knaapen, Delft, NL;
Ruud Olieslagers, Delft, NL;
Dennis Van Den Berg, Delft, NL;
Matijs C. Van Den Boer, Delft, NL;
Diederik Jan Maas, Delft, NL;
Jacques Cor Johan Van Der Donck, Delft, NL;
Freddy Roozeboom, Delft, NL;
Abstract
Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum. The method further comprises switching between supplying the precursor gas from the precursor-gas supply towards the substrate over a first part of the rotation trajectory; and interrupting supplying the precursor gas from the precursor-gas supply over a second part of the rotation trajectory.