Location History:
- Delft, NL (2017)
- 's-Gravenhage, NL (2021)
Company Filing History:
Years Active: 2017-2021
Title: Matijs C Van Den Boer: Innovator in Atomic Layer Deposition
Introduction
Matijs C Van Den Boer is a notable inventor based in 's-Gravenhage, Netherlands. He has made significant contributions to the field of atomic layer deposition, holding 2 patents that showcase his innovative methods and apparatuses.
Latest Patents
His latest patents include a method and apparatus for depositing atomic layers on a substrate. The first patent describes a method of performing atomic layer deposition, which involves supplying a precursor gas towards a substrate using a deposition head. This head includes one or more gas supplies, including a precursor gas supply. The precursor gas reacts near the surface of the substrate to form an atomic layer. The deposition head features an output face that partially faces the substrate surface during the deposition process. This output face has a rounded shape that defines the movement path of the substrate. The precursor-gas supply is moved relative to the substrate by rotating the deposition head while supplying the precursor gas, allowing for the continuous deposition of a stack of atomic layers. The surface of the substrate is kept contactless with the output face through a gas bearing.
The second patent also focuses on a method of depositing an atomic layer on a substrate. This method involves supplying a precursor gas from a precursor-gas supply of a deposition head, which may be part of a rotatable drum. The precursor gas is directed towards the substrate, and the precursor-gas supply is moved by rotating the deposition head along the substrate, which is simultaneously moved along the rotating drum. This method includes switching between supplying the precursor gas during a first part of the rotation trajectory and interrupting the supply during a second part.
Career Highlights
Matijs C Van Den Boer is associated with the Netherlands Organization for Applied Scientific Research (TNO), where he continues to advance his research and development in atomic layer deposition technologies.
Collaborations
He has collaborated with notable coworkers such as Raymond Jacobus Wilhelmus Knaapen and Ruud Olieslagers, contributing to the innovative work in his field.
Conclusion
Matijs C Van Den Boer is a prominent figure in the realm of atomic layer deposition, with his patents reflecting his commitment to advancing technology in this area. His work continues to influence the field and inspire future innovations.