The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2014
Filed:
Aug. 15, 2007
Judocus Marie Dominicus Stoeldraijer, Bladel, NL;
Erik Roelof Loopstra, Heeze, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Diederik Jan Maas, Breda, NL;
Judocus Marie Dominicus Stoeldraijer, Bladel, NL;
Erik Roelof Loopstra, Heeze, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Diederik Jan Maas, Breda, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus and method is disclosed to reduce the exposure time that a substrate spends within a main lithographic apparatus by pre- (or post-) exposing one or more edge devices on the substrate. Because an edge device does not ultimately yield a useful device, it can be exposed with a lithographic apparatus that has a lower resolution than that used to expose one or more of the other, complete devices produced from the substrate. Therefore, the pre- (or post-) exposure of an edge device can be performed using a less complex, and less expensive, lithographic device.