Clifton Park, NY, United States of America

Dewei Xu

USPTO Granted Patents = 9 

Average Co-Inventor Count = 3.9

ph-index = 2

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2015-2025

where 'Filed Patents' based on already Granted Patents

9 patents (USPTO):

Title: The Innovative Mind of Dewei Xu: A Leader in Integrated Circuit Design

Introduction

Dewei Xu, an inventive mind residing in Clifton Park, NY, has contributed significantly to the field of integrated circuits. With an impressive portfolio of eight patents, his work continues to shape the landscape of electronics and semiconductor technology.

Latest Patents

Among his latest innovations, Dewei Xu has developed a patent for an integrated circuit structure featuring capacitor electrodes in different inter-level dielectric (ILD) layers. This invention describes an integrated circuit (IC) structure that incorporates a first ILD layer with vertical electrodes and capacitor dielectric film strategically positioned between them, enhancing the efficiency and performance of modern ICs.

Another notable patent focuses on cascaded sensing circuits designed for detecting and monitoring cracks within an integrated circuit. This system includes multiple electrically conductive structures surrounding a protective barrier in an inactive region of an IC. It features stages of sensing circuits that work in unison to detect changes in electrical characteristics, indicating potential damage, thereby providing a robust solution for maintaining the integrity of integrated circuits.

Career Highlights

Dewei Xu's professional journey includes significant tenures at renowned companies in the semiconductor industry, including Globalfoundries U.S. Inc. and Globalfoundries Inc. His experience has greatly influenced his innovative capabilities, allowing him to devise solutions that address several industry challenges.

Collaborations

Throughout his career, Dewei has collaborated with esteemed colleagues such as Sunil Kumar Singh and Nicholas A Polomoff. These collaborations have fostered an environment of innovation, enabling the development of cutting-edge technologies in the realm of integrated circuits.

Conclusion

Dewei Xu stands out as a prominent figure in the field of integrated circuits, with innovative patents that exemplify his technical expertise and creativity. His contributions not only advance the industry but also pave the way for future innovations in electronic design and manufacturing. As technology continues to evolve, the impact of Xu's work will undoubtedly resonate within the semiconductor community for years to come.

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