Company Filing History:
2 out of 156 
1 out of 37,972 
Years Active: 1994-2008
Title: Debra K Gould: Innovator in Capacitor Technology
Introduction: Debra K Gould, an accomplished inventor based in Nampa, ID, is recognized for her significant contributions to capacitor technology and etching processes. With three patents to her name, Gould has made strides in the fields of electronics and semiconductor manufacturing.
Latest Patents: Among her latest patents are innovative advancements in capacitor constructions. One patent describes a capacitor construction that includes a first electrode and a specialized layer designed to enhance performance by exhibiting a lower RC time constant compared to conventional designs. This layer may serve to prevent silicon from forming metal silicide material between the electrode and the supporting surface, significantly improving the functioning of memory devices.
Another notable patent involves a high selective nitride etch process that employs NF₃ ions and nitrogen ions. This cleaner and selective etch technique creates substantially vertical sidewalls, which is especially beneficial for etching submicron features in semiconductor fabrication.
Career Highlights: Debra's career is marked by her tenure at prominent companies such as Micron Semiconductor, Inc., and Micron Technology Incorporated. Her work in these organizations has positioned her as a leading figure in the semiconductor industry, particularly in the development of innovative technologies that enhance electronic component efficiency.
Collaborations: Throughout her career, Debra has collaborated with talented colleagues, including David J Keller and Brent A McClure. These partnerships have contributed to the development and successful implementation of her patented technologies, furthering advancements in the field.
Conclusion: Debra K Gould continues to be an influential inventor, leaving her mark on capacitor technology and etching processes. Her groundbreaking patents not only enhance the functionality of electronic devices but also pave the way for future innovations in the semiconductor industry. Her contributions underline the crucial role of women in engineering and technology fields, inspiring the next generation of inventors.