David S Marx

Title: The Innovative Contributions of David S. Marx

Introduction

David S. Marx is a notable inventor based in Newbury Park, California, with a remarkable portfolio of eight patents. His work primarily focuses on advancements in microfabrication processes and technologies that enhance the efficiency and accuracy of semiconductor manufacturing.

Latest Patents

Among his latest patents, one significant innovation is the method for assessing the alignment of the top and bottom ends of Through-Silicon Vias (TSVs). This method involves determining the geometries and positions of TSVs formed within a substrate, allowing for precise evaluations of individual TSVs as well as the overall pattern. Another noteworthy patent involves a device and methods for measuring the thickness of wafer layers, the depth of etched features, and the three-dimensional profile of a wafer. This device includes a source/receiver section with a broadband source and a signal processing section that utilizes an interferometer to analyze received spectra.

Career Highlights

David S. Marx has made significant contributions to the field through his work at reputable companies such as Rudolph Technologies, Inc. and Tamar Technology, Inc. His expertise in microfabrication has positioned him as a key player in the development of innovative technologies that drive the semiconductor industry forward.

Collaborations

Throughout his career, David has collaborated with esteemed colleagues, including David L. Grant and Michael A. Mahoney. These partnerships have fostered an environment of innovation and have led to the successful development of various technologies.

Conclusion

David S. Marx's contributions to the field of microfabrication and semiconductor technology are noteworthy. His innovative patents and collaborations reflect his commitment to advancing the industry and enhancing manufacturing processes.