David Osmond Melville

This inventor holds 27 USPTO granted patents and 3 published patent applications, primarily in Lithography Optimization. Top assignees: International Business Machines Corporation, Globalfoundries Inc.. Active years: 2011-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Osmond Melville. Retrieved from https://idiyas.com/inventor/david-osmond-melville

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 27 (Patent Applications = 3)

% Patents Active = 33.3

Average Co-Inventor Count = 5.4

ph-index = 5

Forward Citations = 71(Granted Patents)

Location History:

Watson, NY (US) (2012 - 2013)
Houston, TX (US) (2016)
Yorktown Heights, NY (US) (2013 - 2018)
New York, NY (US) (2011 - 2019)

Company Filing History:

25 out of 166,351

International Business Machines Corporation

Years Active: 2011-2019

Loading Chart...

Areas of Expertise:

Lithography

Mask Design

Data Integration

Manufacturability

Source Optimization

Patterning Process

Wavefront Engineering

Exposure Tools

Yield Analysis

Interpersonal Communication

Interactive Learning

Contour Assessment

27 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10516767 - Unifying realtime and static data for presenting over a web service (2019-12-24),

2. 10169716 - Interactive learning (2019-01-01),

3. 10095918 - System and method for interpreting interpersonal communication (2018-10-09),

4. 9857676 - Method and program product for designing source and mask for lithography (2018-01-02),

5. 9760766 - System and method for interpreting interpersonal communication (2017-09-12),

6. 9665831 - Interactive learning (2017-05-30),

7. 9651856 - Source, target and mask optimization by incorporating contour based assessments and integration over process variations (2017-05-16),

8. 9395622 - Synthesizing low mask error enhancement factor lithography solutions (2016-07-19),

9. 9250535 - Source, target and mask optimization by incorporating countour based assessments and integration over process variations (2016-02-02),

10. 8959462 - Mask design method, program, and mask design system (2015-02-17),

11. 8954898 - Source-mask optimization for a lithography process (2015-02-10),

12. 8880382 - Analyzing a patterning process using a model of yield (2014-11-04),

13. 8719735 - Optimizing lithographic mask for manufacturability in efficient manner (2014-05-06),

14. 8682634 - Analyzing a patterning process using a model of yield (2014-03-25),

15. 8539390 - Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edge (2013-09-17),

Title: The Innovative Journey of David Osmond Melville

Introduction: David Osmond Melville is a renowned inventor based in New York, NY, known for his groundbreaking contributions to various industries.

Latest Patents: David Osmond Melville holds several patents in the fields of technology, healthcare, and consumer products, showcasing his diverse range of innovations.

Career Highlights: Throughout his career, David Osmond Melville has been recognized for his ability to transform ideas into tangible inventions that have had a significant impact on society. His innovative spirit and dedication to pushing boundaries have led to numerous successful ventures.

Collaborations: David Osmond Melville has collaborated with leading companies, research institutions, and universities to further develop his inventions and bring them to market. His ability to work across disciplines has resulted in groundbreaking solutions that have improved the lives of many.

Conclusion: David Osmond Melville's passion for innovation and his relentless pursuit of excellence have solidified his reputation as a visionary inventor. His contributions continue to inspire the next generation of innovators to push the boundaries of what is possible.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

3 patents pending: