The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2013
Filed:
Jan. 31, 2011
Tadanobu Inoue, Kanagawa-ken, JP;
Alan E. Rosenbluth, Yorktown Heights, NY (US);
Kehan Tian, Hopewell Junction, NY (US);
David O. Melville, Yorktown Heights, NY (US);
Masaharu Sakamoto, Kanagawa-ken, JP;
Tadanobu Inoue, Kanagawa-ken, JP;
Alan E. Rosenbluth, Yorktown Heights, NY (US);
Kehan Tian, Hopewell Junction, NY (US);
David O. Melville, Yorktown Heights, NY (US);
Masaharu Sakamoto, Kanagawa-ken, JP;
International Business Machines Corporation, Armonk, NY (US);
Abstract
The manufacturability of a lithographic mask employed in fabricating instances of a semiconductor device is determined. Target edge pairs are selected from mask layout data of the mask, for determining a manufacturing penalty in making the mask. The manufacturability of the mask, including the manufacturing penalty in making the mask, is determined based on the target edge pairs as selected, and is dependent on the manufacturing penalty in making the mask. Determining the manufacturability of the mask includes, for a selected edge pair having first and second edges that are at least substantially parallel to one another, determining a manufacturing shape penalty owing to an aspect ratio of the first edge relative to a size of a gap between the first edge and the second edge. This penalty takes into account a pair of connected edges of the first edge that are at least substantially parallel to the first edge.