The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2014
Filed:
Jul. 14, 2011
Masaharu Sakamoto, Yamato, JP;
Alan E. Rosenbluth, Yorktown Heights, NY (US);
Marc Alan Szeto-millstone, Seattle, WA (US);
Tadanobu Inoue, Yamato, JP;
Kehan Tian, Hopewell Junction, NY (US);
Andreas Waechter, Yorktown Heights, NY (US);
Jonathan Lee, Yorktown Heights, NY (US);
David Osmond Melville, Yorktown Heights, NY (US);
Masaharu Sakamoto, Yamato, JP;
Alan E. Rosenbluth, Yorktown Heights, NY (US);
Marc Alan Szeto-Millstone, Seattle, WA (US);
Tadanobu Inoue, Yamato, JP;
Kehan Tian, Hopewell Junction, NY (US);
Andreas Waechter, Yorktown Heights, NY (US);
Jonathan Lee, Yorktown Heights, NY (US);
David Osmond Melville, Yorktown Heights, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Mask layout data of a lithographic mask includes polygons that each include horizontal and vertical edges. Each of a number of target edge pairs is defined by two edges of one or more of the polygons. A search box having a boundary coincident with a given edge of the edges of the polygons is specified. Whether the search box includes at least one edge of the edges of the polygons in addition to the given edge is determined. Where the search box includes at least one edge, at least one of the target edge pairs is specified as including the given edge and one of the at least one edge. For each target edge pair that has been specified, a manufacturability penalty value is determined. A dynamic manufacturability constraint table and a non-zero multiplier table are maintained.