Company Filing History:
Years Active: 2004-2014
Title: Innovations of Jonathan Lee
Introduction
Jonathan Lee is a notable inventor based in Yorktown Heights, NY (US). He has made significant contributions to the field of technology, particularly through his work at International Business Machines Corporation (IBM). With a total of 4 patents to his name, Lee's innovations reflect his expertise and dedication to advancing technology.
Latest Patents
One of Jonathan Lee's latest patents focuses on optimizing lithographic masks for manufacturability in an efficient manner. This patent involves a method where mask layout data includes polygons with horizontal and vertical edges. The process defines target edge pairs and utilizes a search box to determine manufacturability penalty values. Another significant patent by Lee is a method and system for generating profiles of solutions that trade off the number of activities utilized against the objective value for bilinear integer optimization models. This innovative approach partitions activities into known and potential new activities, generating a model through non-linear integer programming.
Career Highlights
Throughout his career at IBM, Jonathan Lee has demonstrated a commitment to innovation and problem-solving. His work has not only contributed to the company's success but has also advanced the field of technology as a whole. Lee's patents showcase his ability to tackle complex challenges and develop effective solutions.
Collaborations
Jonathan Lee has collaborated with esteemed colleagues such as David Osmond Melville and Alan Edward Rosenbluth. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
In summary, Jonathan Lee is a distinguished inventor whose work at IBM has led to several impactful patents. His contributions to lithographic mask optimization and integer optimization models highlight his innovative spirit and technical expertise.