Company Filing History:
Years Active: 2010-2018
Title: David Meendering: Innovator in Molybdenum Sputtering Technologies
Introduction
David Meendering is a notable inventor based in Coldwater, MI (US). He has made significant contributions to the field of materials science, particularly in the development of molybdenum sputtering targets. With a total of six patents to his name, Meendering's work has advanced the technology used in thin film deposition processes.
Latest Patents
Among his latest patents, Meendering has developed methods for forming molybdenum sputtering targets. In these embodiments, sputtering targets are created by introducing molybdenum powder into a sheet bar mold, pressing the powder to form a sheet bar, and sintering the sheet bar to create an ingot with a density of at least 90% of theoretical density. The ingot is then preheated, rolled into a plate, and heat-treated to enhance its properties. Another significant patent involves methods of depositing thin films using molybdenum sputtering targets. This process includes the formation of tubular sputtering targets, which are sputtered to produce thin films of molybdenum. The targets are designed to have a uniform texture with specific crystallographic orientations, which are crucial for their performance in various applications.
Career Highlights
David Meendering is currently employed at H.C. Starck GmbH, where he continues to innovate in the field of materials engineering. His expertise in sputtering technologies has positioned him as a key player in the development of advanced materials for various industrial applications.
Collaborations
Meendering has collaborated with several professionals in his field, including Prabhat Kumar and Brad Lemon. These collaborations have further enriched his research and development efforts, leading to advancements in sputtering technology.
Conclusion
David Meendering's contributions to the field of molybdenum sputtering technologies highlight his innovative spirit and dedication to advancing materials science. His patents reflect a commitment to improving manufacturing processes and enhancing the performance of thin films in various applications.