Nashua, NH, United States of America

David L Chapek

USPTO Granted Patents = 23 

Average Co-Inventor Count = 2.1

ph-index = 7

Forward Citations = 193(Granted Patents)


Location History:

  • Merrimack, NH (US) (2000 - 2007)
  • Boise, ID (US) (1998 - 2010)
  • Nashua, NH (US) (2000 - 2012)
  • Aliso Biejo, CA (US) (2012)

Company Filing History:


Years Active: 1998-2012

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23 patents (USPTO):

Title: Innovations and Contributions of David L. Chapek in Semiconductor Technology

Introduction

David L. Chapek, based in Nashua, NH, has made significant contributions to the field of semiconductor technology, holding a remarkable portfolio of 23 patents. His innovative work has paved the way for advancements in the development and manufacturing of semiconductor devices, showcasing his expertise and dedication to pushing technological boundaries.

Latest Patents

Among his latest patents, one notable invention focuses on semiconductor devices that incorporate a layer of polycrystalline silicon with a smooth morphology. This patented method involves controlling the morphology of deposited silicon on a layer of silicon dioxide, implemented through a series of precise steps including the implantation of hydrogen ions into the silicon dioxide layer and the formation of a polycrystalline silicon layer.

Another significant patent outlines a method for creating a self-aligned isolation structure that utilizes sidewall spacers as an etch mask. This method is essential for forming microelectronic structures within a semiconductor substrate, which includes the selective removal of dielectric material and the formation of insulating material that conforms to the substrate, leading to the enhancement of semiconductor device isolation.

Career Highlights

David L. Chapek has held impactful roles at prominent companies such as Micron Technology and Varian Associates, Inc. His tenure at these organizations not only illustrates his technical prowess but also underscores his influence within the industry. Through his work, he has contributed to various advancements that have helped shape modern semiconductor technology.

Collaborations

Throughout his career, Chapek has collaborated with notable professionals like Karl M. Robinson and John T. Moore. These partnerships have facilitated the exchange of ideas and accelerated the development of innovative solutions in the semiconductor domain.

Conclusion

David L. Chapek’s extensive patent portfolio and his collaborative efforts reflect his profound impact on the semiconductor industry. His continuous commitment to innovation has rendered him a crucial figure in advancing technologies that are vital for future developments in electronics and beyond. As the industry evolves, the influence of inventors like Chapek will undoubtedly play a pivotal role in addressing emerging challenges and opportunities in technology.

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