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For the Inventor, By the Inventor

Turnhout, Belgium

David Frans Simon Deckers

USPTO Granted Patents = 10 

Average Co-Inventor Count = 6.7

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:

goldMedal10 out of 4,883 
 
Asml Netherlands B.v.
 patents

Years Active: 2019-2025

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10 patents (USPTO):
1. 12366809 - Methods and apparatus for controlling a lithographic process (2025-07-22),
2. 11782349 - Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus (2023-10-10),
3. 11754931 - Method for determining corrections for lithographic apparatus (2023-09-12),
4. 11592753 - Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus (2023-02-28),
5. 11327407 - Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus (2022-05-10),
6. 11054813 - Method and apparatus for controlling an industrial process using product grouping (2021-07-06),
7. 10996573 - Method and system for increasing accuracy of pattern positioning (2021-05-04),
8. 10915689 - Method and apparatus to correct for patterning process error (2021-02-09),
9. 10877381 - Methods of determining corrections for a patterning process (2020-12-29),
10. 10191390 - Method for transferring a mark pattern to a substrate, a calibration method, and a lithographic apparatus (2019-01-29),

Title: David Frans Simon Deckers: Pioneering Innovations in Lithography

Introduction:

David Frans Simon Deckers is a visionary inventor whose contributions in the field of lithography have left an indelible mark on the global innovation landscape. His relentless commitment to excellence serves as an inspiration to inventors and creators worldwide.

Latest Patents:

Deckers holds an impressive portfolio of 9 patents, with his latest inventions revolving around methods for determining corrections in the lithographic process. These patents include advancements in device manufacturing methods, control systems for lithographic apparatus, and innovative approaches to lithographic processes.

Career Highlights:

Currently affiliated with ASML Netherlands B.V., Deckers has solidified his reputation as a leading innovator in the realm of lithography. His expertise and dedication have driven technological advancements in the semiconductor industry, with a particular focus on process optimization and precision engineering.

Collaborations:

Throughout his career, Deckers has collaborated with esteemed colleagues such as Alexander Ypma and Weitian Kou. These partnerships have led to synergistic innovation and groundbreaking developments in lithography technologies, further establishing Deckers as a pioneer in his field.

Conclusion:

In conclusion, David Frans Simon Deckers exemplifies the transformative power of innovation and the profound impact that a single individual can have on shaping the future of technology. His contributions to the field of lithography stand as a testament to his ingenuity and unwavering commitment to pushing the boundaries of what is possible.

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