The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2023
Filed:
Mar. 18, 2020
Asml Netherlands B.v., Veldhoven, NL;
Roy Werkman, Eindhoven, NL;
David Frans Simon Deckers, Turnhout, BE;
Simon Philip Spencer Hastings, San Jose, CA (US);
Jeffrey Thomas Ziebarth, San Jose, CA (US);
Samee Ur Rehman, Milpitas, CA (US);
Davit Harutyunyan, San Jose, CA (US);
Chenxi Lin, Newark, CA (US);
Yana Cheng, San Jose, CA (US);
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method for determining a correction for an apparatus used in a process of patterning substrates, the method including: obtaining a group structure associated with a processing history and/or similarity in fingerprint of to be processed substrates; obtaining metrology data associated with a plurality of groups within the group structure, wherein the metrology data is correlated between the groups; and determining the correction for a group out of the plurality of groups by applying a model to the metrology data, the model including at least a group-specific correction component and a common correction component.