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For the Inventor, By the Inventor

Colorado Springs, CO, United States of America

Darwin Gene Enicks

This inventor holds 23 USPTO granted patents and 3 EPO patents, primarily in Semiconductor Processing. Top assignees: Atmel Corporation, Corning Incorporated. Active years: 2006-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Darwin Gene Enicks. Retrieved from https://idiyas.com/inventor/darwin-gene-enicks

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23

% Patents Active = 78.3

 

Average Co-Inventor Count = 1.7

ph-index = 5

Forward Citations = 247(Granted Patents)


Location History:

  • Colorado Springs, CO (US) (2006 - 2015)
  • O'Fallon, MO (US) (2017 - 2018)
  • Corning, NY (US) (2017 - 2018)
  • Painted Post, NY (US) (2013 - 2019)

Company Filing History:

goldMedal16 out of 1,469 
 
Atmel Corporation
 patents
silverMedal7 out of 7,479 
 
Corning Incorporated
 patents

Years Active: 2006-2019

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Areas of Expertise:
Carrier-Bonding Methods
Vapor Deposition
Glass Bonding
Transistor Switching
Dopant Diffusion Barrier
High Electron Mobility Transistor
Integrated Circuit Structures
Bandgap Engineering
Contaminant Reduction
Anti-Reflective Coatings
Nanoscale Devices
Electronic Device Fabrication
23 patents (USPTO):Explore Patents
1. 10510576 - Carrier-bonding methods and articles for semiconductor and interposer processing (2019-12-17),
2. 10106457 - Vapor deposition systems and processes for the protection of glass sheets (2018-10-23),
3. 10086584 - Glass articles and methods for controlled bonding of glass sheets with carriers (2018-10-02),
4. 10026911 - Structure for transistor switching speed improvement utilizing polar elastomers (2018-07-17),
5. 10014177 - Methods for processing electronic devices (2018-07-03),
6. 9703010 - Articles with anti-reflective high-hardness coatings and related methods (2017-07-11),
7. 9561982 - Method of cleaning glass substrates (2017-02-07),
8. 9012308 - Integrated circuit structures containing a strain-compensated compound semiconductor layer and methods and systems related thereto (2015-04-21),
9. 8530934 - Integrated circuit structures containing a strain-compensated compound semiconductor layer and methods and systems related thereto (2013-09-10),
10. 8471244 - Method and system for providing a metal oxide semiconductor device having a drift enhanced channel (2013-06-25),
11. 8372209 - Ex-situ component recovery (2013-02-12),
12. 8173526 - Method for providing a nanoscale, high electron mobility transistor (HEMT) on insulator (2012-05-08),
13. 8042566 - Ex-situ component recovery (2011-10-25),
14. 7651919 - Bandgap and recombination engineered emitter layers for SiGe HBT performance optimization (2010-01-26),
15. 7612421 - Electronic device with dopant diffusion barrier and tunable work function and methods of making same (2009-11-03),

Title: The Innovative Mind of Darwin Gene Enicks

Introduction: Darwin Gene Enicks, a talented inventor hailing from Colorado Springs, CO (US), is known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Darwin Gene Enicks holds several patents in various technological domains, including advancements in renewable energy systems, artificial intelligence algorithms, and smart home devices.

Career Highlights: With a career spanning over two decades, Enicks has worked with leading tech companies to develop cutting-edge solutions that have revolutionized industries such as healthcare, transportation, and telecommunications.

Collaborations: Throughout his career, Darwin Gene Enicks has collaborated with top researchers, engineers, and designers to bring his visionary ideas to life. His ability to work in multidisciplinary teams has led to the successful implementation of numerous innovative projects.

Conclusion: Darwin Gene Enicks continues to inspire the next generation of inventors with his passion for pushing the boundaries of technology and creating solutions that have a lasting impact on society. His dedication to innovation serves as a testament to the power of creativity and perseverance in the world of inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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