Ramat Gan, Israel

Daniel Kandel

USPTO Granted Patents = 7 

Average Co-Inventor Count = 8.3

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Rehovot, IL (2021 - 2023)
  • Ramat Gan, IL (2021 - 2023)

Company Filing History:


Years Active: 2021-2025

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7 patents (USPTO):

Title: The Innovations of Daniel Kandel

Introduction

Daniel Kandel is a prominent inventor based in Ramat Gan, Israel. He has made significant contributions to the field of semiconductor manufacturing, holding a total of seven patents. His work focuses on metrology and process control, which are crucial for advancing semiconductor technology.

Latest Patents

One of Daniel Kandel's latest patents involves a semiconductor metrology system that includes a spectrum acquisition tool. This tool collects baseline scatterometric spectra on first semiconductor wafer targets using a first measurement protocol. It also addresses various sources of spectral variability by creating variability sets of scatterometric spectra on second semiconductor wafer targets. These variability sets embody the spectral variability. Additionally, the system features a reference metrology tool for collecting parameter values of the first semiconductor wafer targets using a second measurement protocol. A training unit is also included, which utilizes the collected spectra and values to train a prediction model. This model employs machine learning techniques to minimize an associated loss function that incorporates spectral variability terms. Ultimately, the prediction model is designed to predict values for production semiconductor wafer targets based on their spectra.

Career Highlights

Throughout his career, Daniel Kandel has worked with notable companies such as Nova Corporation and Nova Measuring Instruments Ltd. His experience in these organizations has allowed him to refine his expertise in semiconductor metrology and process control.

Collaborations

Daniel has collaborated with esteemed colleagues, including Vladimir Machavariani and Michael Shifrin. Their combined efforts have contributed to advancements in the semiconductor industry.

Conclusion

Daniel Kandel's innovative work in semiconductor metrology and process control has established him as a key figure in the field. His patents and collaborations reflect his commitment to advancing technology in semiconductor manufacturing.

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