The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2021
Filed:
Feb. 27, 2018
Nova Measuring Instruments Ltd., Rehovot, IL;
Vladimir Machavariani, Rishon-Lezion, IL;
Michael Shifrin, Ashqelon, IL;
Daniel Kandel, Ramat Gan, IL;
Victor Kucherov, Ashdod, IL;
Igor Ziselman, Modi'in-Maccabim-Re'ut, IL;
Ronen Urenski, Bat Yam, IL;
Matthew Sendelbach, Fishkill, NY (US);
NOVA MEASURING INSTRUMENTS LTD., Rehovot, IL;
Abstract
A control system is presented for use in measuring one or more parameters of a three-dimensional patterned structure. The control system is configured as a computer system comprising a data processor configured to receive and process raw measured TEM image data, TEM, and generate output data indicative of one or more parameters of a patterned structure. The data processor comprises an optimization module configured and operable to utilize data indicative of one or more parameters of TEM measurement mode and perform a fitting procedure between the raw measured TEM image data, TEM, and a predetermined simulated TEM image data, TEMbased on a parametrized three-dimensional model of features of the patterned structure, and generate simulated image data corresponding to a best fit condition, to thereby enable determination therefrom of the one or more parameters of the structure.