Ashqelon, Israel

Michael Shifrin

USPTO Granted Patents = 6 

Average Co-Inventor Count = 4.3

ph-index = 2

Forward Citations = 30(Granted Patents)


Location History:

  • Ashqelon, IL (2010 - 2023)
  • Rehovot, IL (2024)

Company Filing History:


Years Active: 2010-2024

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6 patents (USPTO):

Title: **Michael Shifrin: Innovator in Advanced Metrology Techniques**

Introduction

Michael Shifrin is a notable inventor based in Ashqelon, Israel, renowned for his contributions to the field of metrology. With a total of five patents to his name, he has dedicated his career to developing innovative methods that enhance the accuracy of measurements in three-dimensional patterned structures. His work significantly impacts industries relying on precise metrology techniques.

Latest Patents

Among Michael's latest inventions are two groundbreaking patents related to metrology methods and systems. The first patent features a TEM-based metrology method designed to determine parameters of a three-dimensional patterned structure. This method involves a fitting procedure using measured TEM image data and simulated TEM image data, ultimately deriving the measured Lamellae position based on the best-fit condition between both data sets. The outcome facilitates the accurate determination of the structure's parameters.

His second patent similarly focuses on metrology methods, providing an advanced approach to identifying parameters through a fitting procedure between raw measured TEM image data and predetermined simulated TEM image data. This methodology incorporates simulated weight maps for different features of the patterned structure, allowing for precise parameter extraction from the best-fit condition.

Career Highlights

Throughout his career, Michael Shifrin has made significant strides in the field of metrology. His innovative approaches have led to patents that are at the forefront of research and development. His keen focus on enhancing measurement accuracy has garnered attention and respect within the scientific community.

Collaborations

Michael has had the privilege of collaborating with other talented individuals in his field. Notable coworkers include Vladimir Machavariani and Daniel Kandel, with whom he has worked closely to advance their shared goals in metrology research and development.

Conclusion

Michael Shifrin stands out as a prominent inventor dedicated to advancing metrology techniques. His innovative patents demonstrate his commitment to precision and accuracy in measurement systems. As he continues to push the boundaries of technology, Michael's contributions are set to shape the future of metrology and inspire future generations of inventors.

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