The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2022
Filed:
Aug. 29, 2018
Nova Ltd., Rehovot, IL;
Vladimir Machavariani, Rishon-Lezion, IL;
Michael Shifrin, Ashqelon, IL;
Daniel Kandel, Ramat Gan, IL;
Victor Kucherov, Ashdod, IL;
Igor Ziselman, Modi'In-Maccabim-Re'Ut, IL;
Ronen Urenski, Bat Yam, IL;
Matthew Sendelbach, Fishkill, NY (US);
NOVA LTD, Rehovot, IL;
Abstract
A metrology method for use in determining one or more parameters of a patterned structure, the method including providing raw measured TEM image data, TEM, data indicative of a TEM measurement mode, and predetermined simulated TEM image data including data indicative of one or more simulated TEM images of a structure similar to the patterned structure under measurements and a simulated weight map including weights assigned to different regions in the simulated TEM image corresponding to different features of the patterned structure, performing a fitting procedure between the raw measured TEM image data and the predetermined simulated TEM image data and determining one or more parameters of the structure from the simulated TEM image data corresponding to a best fit condition.