The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2021
Filed:
Jun. 14, 2019
Nova Measuring Instruments Ltd., Rehovot, IL;
Eitan Rothstein, Rehovot, IL;
Ilya Rubinovich, Rehovot, IL;
Noam Tal, Rehovot, IL;
Barak Bringoltz, Rehovot, IL;
Yongha Kim, Rehovot, IL;
Ariel Broitman, Rehovot, IL;
Oded Cohen, Rehovot, IL;
Eylon Rabinovich, Rehovot, IL;
Tal Zaharoni, Rehovot, IL;
Shay Yogev, Rehovot, IL;
Daniel Kandel, Rehovot, IL;
NOVA MEASURING INSTRUMENTS LTD., Rehovot, IL;
Abstract
A semiconductor metrology system including a spectrum acquisition tool for collecting, using a first measurement protocol, baseline scatterometric spectra on first semiconductor wafer targets, and for various sources of spectral variability, variability sets of scatterometric spectra on second semiconductor wafer targets, the variability sets embodying the spectral variability, a reference metrology tool for collecting, using a second measurement protocol, parameter values of the first semiconductor wafer targets, and a training unit for training, using the collected spectra and values, a prediction model using machine learning and minimizing an associated loss function incorporating spectral variability terms, the prediction model for predicting values for production semiconductor wafer targets based on their spectra.