Company Filing History:
Years Active: 2021-2025
Title: Eitan Rothstein: Innovator in Semiconductor Metrology
Introduction
Eitan Rothstein is a prominent inventor based in Rehovot, Israel. He has made significant contributions to the field of semiconductor manufacturing, particularly in metrology and process control. With a total of 4 patents to his name, Rothstein's work has advanced the capabilities of semiconductor technology.
Latest Patents
Rothstein's latest patents include innovative systems for semiconductor metrology. One notable patent focuses on a semiconductor metrology system that incorporates a spectrum acquisition tool. This tool collects baseline scatterometric spectra on semiconductor wafer targets and addresses various sources of spectral variability. Additionally, it features a reference metrology tool for collecting parameter values and a training unit that employs machine learning to predict values for production semiconductor wafer targets based on their spectra.
Another significant patent involves detecting outliers and anomalies in OCD metrology using machine learning. This system trains an OCD machine learning model with training data that includes multiple pairs of scatterometric data and reference parameters. By calculating outlier metrics and applying thresholds, the model is trained to exclude outlier pairs, enhancing the accuracy of the metrology process.
Career Highlights
Throughout his career, Eitan Rothstein has worked with notable companies in the semiconductor industry, including Nova Corporation and Nova Measuring Instruments Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas in metrology and process control.
Collaborations
Rothstein has collaborated with talented individuals in his field, including Ilya Rubinovich and Barak Bringoltz. These collaborations have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Eitan Rothstein's contributions to semiconductor metrology demonstrate his innovative spirit and commitment to advancing technology. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing, making him a key figure in this field.