The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2024
Filed:
Jan. 07, 2021
Applicant:
Nova Ltd, Rehovot, IL;
Inventors:
Eitan A. Rothstein, Rehovot, IL;
Yongha Kim, Rehovot, IL;
Ilya Rubinovich, Rehovot, IL;
Ariel Broitman, Rehovot, IL;
Olga Krasnykov, Rehovot, IL;
Barak Bringoltz, Rehovot, IL;
Assignee:
NOVA LTD, Rehovot, IL;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/30 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G01B 11/30 (2013.01); G03F 7/70625 (2013.01); G01B 2210/56 (2013.01);
Abstract
A system and methods for OCD metrology are provided including receiving training data for training an OCD machine learning (ML) model, including multiple pairs of corresponding sets of scatterometric data and reference parameters. For each of the pairs, one or more corresponding outlier metrics are by calculated and corresponding outlier thresholds are applied whether a given pair is an outlier pair. The OCD MIL model is then trained with the training data less the outlier pairs.