Company Filing History:
Years Active: 2005-2013
Title: The Innovator Behind Advanced Ion Beam Technologies: Daniel E. Siegfried
Introduction
Daniel E. Siegfried, an accomplished inventor based in Fort Collins, Colorado, has made significant contributions to the field of ion beam technologies. With a remarkable portfolio of 11 patents, his innovative solutions enhance the efficiency and efficacy of ion beam applications in various industries.
Latest Patents
His latest patents demonstrate a strong commitment to innovation in the field. The first, titled "Grid Transparency and Grid Hole Pattern Control for Ion Beam Uniformity," presents a novel design process that enables the modification of hole locations and sizes in an ion beam grid. This patent introduces a control grid that can be adjusted through a change factor, facilitating the generation of optimized grid patterns with improved ion beam uniformity.
Another notable patent by Siegfried is "Sputtered Contamination Shielding for an Ion Source." This invention focuses on reducing the amount and concentration of sputtered contaminants that can affect the quality of target substrates during ion beam processing. The shielding design not only minimizes contaminants before, during, and after the substrate's exposure to the ion beam but also enhances the overall quality of the treated substrates.
Career Highlights
Daniel E. Siegfried is currently associated with Veeco Instruments Inc., where he continues to drive innovations in ion beam technology. His work has positioned the company as a leader in precision instruments and solutions for semiconductor fabrication and related fields.
Collaborations
Throughout his career, Siegfried has collaborated with distinguished colleagues, including David Matthew Burtner and Scott A. Townsend. These partnerships have fostered a rich environment for creativity and innovation, contributing to impactful advancements in their shared field of expertise.
Conclusion
In summary, Daniel E. Siegfried is a prominent inventor whose patents are pushing the boundaries of ion beam technology. His contributions not only reflect his dedication to innovation but also have the potential to shape the future of applications reliant on ion beam processes. As technology continues to evolve, Siegfried's work will undoubtedly play a critical role in advancing the standards of the industry.