Flemington, NJ, United States of America

Dana L Durham

This inventor holds 35 USPTO granted patents, primarily in Photoresist Technology. Top assignees: Hoechst Celanese Corporation, Clariant Finance (Bvi) Limited, American Hoechst Corporation. Active years: 1986-2002.


% Patents Active = 100.0

Average Co-Inventor Count = 2.6

ph-index = 11

Forward Citations = 374(Granted Patents)


Location History:

  • Bloomsbury, NJ (US) (1986 - 1991)
  • E. Greenwich, RI (US) (1993)
  • East Greenwich, RI (US) (1991 - 1997)
  • East Greenwich, NJ (US) (1997)
  • Flemington, NJ (US) (1997 - 2002)

Company Filing History:


Years Active: 1986-2002

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Areas of Expertise:
Photoresist
Antireflective Coatings
Novolak Resins
Light Absorbing Polymers
Photosensitive Compounds
Image Reversal
Metal Ion Reduction
Aqueous Coatings
Developer Composition
Chemical Synthesis
Polyphosphazene Resins
Organic Materials
35 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Dana L Durham

Introduction

Dana L Durham, an accomplished inventor based in Flemington, NJ, has made significant contributions to the field of microelectronics through his innovative inventions. With a remarkable portfolio of 35 patents, he is recognized for his pioneering work in the development of compositions and methods that enhance the fabrication of integrated circuits.

Latest Patents

Among his latest patents, Dana has developed a composition for stripping photoresist and organic materials from substrate surfaces. This invention focuses on a novel amine-free stripping composition that effectively removes organic materials without corroding the underlying substrate. This innovation is crucial for the microelectronics industry, providing an efficient method for maintaining the integrity of integrated circuits.

Another notable patent is the antireflective coating for photoresist compositions. This invention introduces a novel antireflective coating solution that utilizes a unique polymer and a specific mixture of organic solvents. The patented polymer structure includes a unit that absorbs wavelengths from about 180 nm to about 450 nm, enhancing the photolithography process without the need for crosslinking groups.

Career Highlights

Dana’s career has seen him working with reputable companies such as Hoechst Celanese Corporation and Clariant Finance (BVI) Limited, where he honed his expertise in chemical engineering and microelectronics. His work in these organizations set the foundation for his innovative contributions to the field.

Collaborations

Throughout his career, Dana has collaborated with talented professionals in his field, including M Dalil Rahman and Dinesh N Khanna. These collaborations have fostered an environment of innovation and creativity, leading to several groundbreaking patent inventions that have significantly impacted the microelectronics industry.

Conclusion

Dana L Durham stands out as a prominent inventor in the field of microelectronics. With his extensive portfolio of patents and innovative contributions, he continues to influence advancements in the fabrication of integrated circuits. His work exemplifies a commitment to innovation and excellence, paving the way for future developments in this critical field.

Profile summary based on public USPTO records.
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