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Somerville, NJ, United States of America

American Hoechst Corporation

USPTO Granted Patents = 233

Trademarks = 5

Forward Citations = 2,650

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166 inventors (with patents filed for the assignee):

John E Walls (32 out of 42 patents)

Helen H Ong (16 out of 53 patents)

Arthur R McFadden (16 out of 17 patents)

4. Richard C Effland (12 out of 128 patents)

5. James Arthur Profitt (11 out of 43 patents)

6. Grover C Helsley (11 out of 68 patents)

7. Larry A Davis (10 out of 95 patents)

8. Major S Dhillon (9 out of 25 patents)

9. R Scott Caines (8 out of 11 patents)

10. Thomas N Gillich (8 out of 12 patents)

11. Daniel Eugene Aultz (8 out of 9 patents)

12. Richard C Allen (7 out of 41 patents)

13. Michael G Kelly (7 out of 8 patents)

14. Wolfgang Schaub (7 out of 8 patents)

15. Joseph T Strupczewski (6 out of 83 patents)

Core Competencies:

Photoresist

Lithographic Plates

Color Proofing

Aqueous Development

Polyester Film

Chemical Compositions

Enzyme Assays

Soil Repellents

Electrolytes

Thermal Management

Negative Working

233 patents: Sort by Forward Citations

1. 4863827 - Postive working multi-level photoresist (1989-09-05),

2. 4816591 - 6,11-dihydrodibenz[b,e]oxepin-acetic acids and derivatives (1989-03-28),

3. 4810434 - Process for manufacture of surface-modified oriented polymeric film (1989-03-07),

4. 4790293 - Apparatus and method for solar heating of water (1988-12-13),

5. 4772538 - Water developable lithographic composition (1988-09-20),

6. 4772533 - Positive working naphthoquinone diazide color proofing element with (1988-09-20),

7. 4745019 - Graphic film having a copolyester primed polyester film as its substrate (1988-05-17),

8. 4726928 - Radiation-resistant vinyl halide resin compositions and a process for (1988-02-23),

9. 4692398 - Process of using photoresist treating composition containing a mixture (1987-09-08),

10. 4692397 - Process for developing an aqueous alkaline development diazo (1987-09-08),

11. 4681723 - Calender band stripping section and process for stripping calendered (1987-07-21),

12. 4670507 - Resin (1987-06-02),

13. 4665124 - Resin (1987-05-12),

14. 4664709 - Azoacylacetamide dispersing agents and azo-pigment compositions (1987-05-12),

15. 4661056 - Turbulent incineration of combustible materials supplied in low pressure (1987-04-28),

Company Overview

American Hoechst Corporation, headquartered in Somerville, NJ, specializes in the development and manufacturing of advanced photoresist technology. The company focuses on innovative solutions for lithographic plates, color proofing, and aqueous development processes, catering to various industries. Their expertise extends to chemical compositions, enzyme assays, and soil repellents, positioning them as a key player in the chemical and materials sector. With a commitment to research and development, American Hoechst continues to drive advancements in photoresist applications.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 6 2026

233 Patents

#3 in Somerville, NJ

#86 in New Jersey

#1,805 in US

#3,684 in the World

Somerville, NJ, United States of America

American Hoechst Corporation

Forward Citations = 2,650

166 inventors:

John E Walls (32 out of 42 patents)

Helen H Ong (16 out of 53 patents)

Arthur R McFadden (16 out of 17 patents)

4. Richard C Effland (12 out of 128 patents)

5. James Arthur Profitt (11 out of 43 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: American Hoechst Corporation. Retrieved from https://idiyas.com/company/american-hoechst

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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