The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 1997
Filed:
Aug. 16, 1996
Iain McCulloch, Murray Hill, NJ (US);
Ralph R Dammel, Flemington, NJ (US);
Dana L Durham, Flemington, NJ (US);
Ping-Hung Lu, Bridgewater, NJ (US);
Ming Kang, Colonia, NJ (US);
Dinesh N Khanna, Flemington, NJ (US);
Shuji Ding, Branchburg, NJ (US);
Hoechst Celanese Corporation, Somerville, NJ (US);
Abstract
The present invention relates to a novel aqueous antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and water, where the novel polymer of the antireflective coating comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm, at least one unit containing a crosslinking group and at least one unit derived from a hydrophilic vinyl monomer or a vinyl monomer capable of becoming hydrophilic.