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Flemington, NJ, United States of America

Dinesh N Khanna

USPTO Granted Patents = 48

Average Co-Inventor Count = 2.5

ph-index = 16

Forward Citations = 650(Granted Patents)

Location History:

W. Warwick, RI (US) (1989 - 1991)
Warwick, RI (US) (1989 - 1991)
West Warwick, RI (US) (1989 - 1993)
Greenwich, RI (US) (1993)
West Warwick, Kent, RI (US) (1993)
East Greenwich, RI (US) (1994)
E. Greenwich, RI (US) (1994)
Kent, RI (US) (1994)
Flemington, NJ (US) (1995 - 2002)

Company Filing History:

32 out of 1,194

Hoechst Celanese Corporation

Clariant Finance (bvi) Limited

1 out of 832,880

Other

patents

Years Active: 1989-2002

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Areas of Expertise:

Photoresist Compositions

Antireflective Coatings

Polymeric AZO Dyes

Light Absorbing Polymers

Photosensitive Compositions

Polyamide Polymers

Naphthoquinone Diazide

Thermally Soluble Polyimides

Metal Ion Reduction

Quinonediazide Compounds

Crosslinkable Polyimides

High Temperature Positive Photoresists

48 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6368421 - Composition for stripping photoresist and organic materials from substrate surfaces (2002-04-09),

2. 6346361 - Method for synthesizing polymeric AZO dyes (2002-02-12),

3. 6187506 - Antireflective coating for photoresist compositions (2001-02-13),

4. 6106995 - Antireflective coating material for photoresists (2000-08-22),

5. 5994430 - Antireflective coating compositions for photoresist compositions and use (1999-11-30),

6. 5981145 - Light absorbing polymers (1999-11-09),

7. 5976761 - Fractionation of phenol formaldehyde condensate and photoresist (1999-11-02),

8. 5876897 - Positive photoresists containing novel photoactive compounds (1999-03-02),

9. 5866295 - Photosensitive quinolone compounds and a process of preparation (1999-02-02),

10. 5858627 - Image formation utilizing photosensitive compositions containing low (1999-01-12),

11. 5853947 - Quinonediazide positive photoresist utilizing mixed solvent consisting (1998-12-29),

12. 5837417 - Quinone diazide compositions containing low metals p-cresol oligomers (1998-11-17),

13. 5763135 - Light sensitive composition containing an arylhydrazo dye (1998-06-09),

14. 5739265 - Fractionation of phenol formaldehyde condensate and photoresist (1998-04-14),

15. 5733714 - Antireflective coating for photoresist compositions (1998-03-31),

Title: The Innovative Journey of Dinesh N Khanna

Introduction: Dinesh N Khanna, a talented inventor based in Flemington, NJ (US), has made significant contributions to the field of technology through his innovative creations.

Latest Patents: Dinesh N Khanna holds several patents in various technological domains, showcasing his versatility and creativity in inventing new solutions to complex problems.

Career Highlights: With a successful career spanning over two decades, Dinesh N Khanna has worked for renowned tech companies, leading groundbreaking projects and earning recognition for his inventive spirit.

Collaborations: Throughout his career, Dinesh N Khanna has collaborated with top researchers, engineers, and scientists, fostering a culture of innovation and pushing the boundaries of technological advancement.

Conclusion: Dinesh N Khanna's passion for innovation and his dedication to creating impactful solutions have solidified his reputation as a pioneering inventor in the tech industry.

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