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For the Inventor, By the Inventor

Flemington, NJ, United States of America

Dinesh N Khanna

This inventor holds 48 USPTO granted patents, primarily in Photoresist Technology. Top assignees: Hoechst Celanese Corporation, Clariant Finance (Bvi) Limited, Other. Active years: 1989-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dinesh N Khanna. Retrieved from https://idiyas.com/inventor/dinesh-n-khanna

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 48

% Patents Active = 100.0

Average Co-Inventor Count = 2.5

ph-index = 16

Forward Citations = 650(Granted Patents)


Location History:

  • W. Warwick, RI (US) (1989 - 1991)
  • Warwick, RI (US) (1989 - 1991)
  • West Warwick, RI (US) (1989 - 1993)
  • Greenwich, RI (US) (1993)
  • West Warwick, Kent, RI (US) (1993)
  • East Greenwich, RI (US) (1994)
  • E. Greenwich, RI (US) (1994)
  • Kent, RI (US) (1994)
  • Flemington, NJ (US) (1995 - 2002)

Company Filing History:

goldMedal32 out of 1,194 
 
Hoechst Celanese Corporation
 patents
silverMedal15 out of 507 
 
Clariant Finance (Bvi) Limited
 patents
bronzeMedal1 out of 834,513 
Other
 patents

Years Active: 1989-2002

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Areas of Expertise:
Photoresist
Antireflective Coatings
Polymeric Dyes
Light Sensitive Compositions
Photosensitizers
Polyimides
Phenol Formaldehyde
Diazo Compounds
Naphthoquinone
Aqueous Coatings
Positive Photoresists
Thermal Solubility
48 patents (USPTO):Explore Patents
1. 6368421 - Composition for stripping photoresist and organic materials from substrate surfaces (2002-04-09),
2. 6346361 - Method for synthesizing polymeric AZO dyes (2002-02-12),
3. 6187506 - Antireflective coating for photoresist compositions (2001-02-13),
4. 6106995 - Antireflective coating material for photoresists (2000-08-22),
5. 5994430 - Antireflective coating compositions for photoresist compositions and use (1999-11-30),
6. 5981145 - Light absorbing polymers (1999-11-09),
7. 5976761 - Fractionation of phenol formaldehyde condensate and photoresist (1999-11-02),
8. 5876897 - Positive photoresists containing novel photoactive compounds (1999-03-02),
9. 5866295 - Photosensitive quinolone compounds and a process of preparation (1999-02-02),
10. 5858627 - Image formation utilizing photosensitive compositions containing low (1999-01-12),
11. 5853947 - Quinonediazide positive photoresist utilizing mixed solvent consisting (1998-12-29),
12. 5837417 - Quinone diazide compositions containing low metals p-cresol oligomers (1998-11-17),
13. 5763135 - Light sensitive composition containing an arylhydrazo dye (1998-06-09),
14. 5739265 - Fractionation of phenol formaldehyde condensate and photoresist (1998-04-14),
15. 5733714 - Antireflective coating for photoresist compositions (1998-03-31),

Title: The Innovative Journey of Dinesh N Khanna

Introduction: Dinesh N Khanna, a talented inventor based in Flemington, NJ (US), has made significant contributions to the field of technology through his innovative creations.

Latest Patents: Dinesh N Khanna holds several patents in various technological domains, showcasing his versatility and creativity in inventing new solutions to complex problems.

Career Highlights: With a successful career spanning over two decades, Dinesh N Khanna has worked for renowned tech companies, leading groundbreaking projects and earning recognition for his inventive spirit.

Collaborations: Throughout his career, Dinesh N Khanna has collaborated with top researchers, engineers, and scientists, fostering a culture of innovation and pushing the boundaries of technological advancement.

Conclusion: Dinesh N Khanna's passion for innovation and his dedication to creating impactful solutions have solidified his reputation as a pioneering inventor in the tech industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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