The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 1998

Filed:

Dec. 21, 1995
Applicant:
Inventors:

Stanley F Wanat, Scotch Plains, NJ (US);

M Dalil Rahman, Flemington, NJ (US);

Dinesh N Khanna, Flemington, NJ (US);

Daniel P Aubin, Voluntown, CT (US);

Sunit S Dixit, Flemington, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03C / ;
U.S. Cl.
CPC ...
430165 ; 430169 ; 430191 ; 430192 ; 430193 ;
Abstract

A photosensitive positive working photosensitive composition suitable for use as a photoresist, which comprises an admixture of at least one water insoluble, aqueous alkali soluble, film forming novolak resin; at least one o-diazonaphthoquinone photosensitizer; and a photoresist solvent mixture comprising a propylene glycol alkyl ether acetate and 3-methyl-3-methoxy butanol and process for producing such a composition.


Find Patent Forward Citations

Wanat, Stanley. (1998). Quinonediazide positive photoresist utilizing mixed solvent consisting (U.S. Patent No. 5853947). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5853947

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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