Scotch Plains, NJ, United States of America

Stanley F Wanat

This inventor holds 23 USPTO granted patents, plus 1 CIPO patent and 1 EPO patent, primarily in Photoresist Technology. Top assignees: Hoechst Celanese Corporation, American Hoechst Corporation, Clariant Finance (Bvi) Limited. Active years: 1979-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Stanley F Wanat. Retrieved from https://idiyas.com/inventor/stanley-f-wanat

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23

% Patents Active = 95.7

CIPO Patents = 1 (Patent Applications = 1)

EPO Patents = 1

Average Co-Inventor Count = 2.2

ph-index = 8

Forward Citations = 254(Granted Patents)

Company Filing History:

9 out of 1,194

Hoechst Celanese Corporation

patents

6 out of 233

American Hoechst Corporation

patents

6 out of 507

Clariant Finance (Bvi) Limited

Clariant Finance Lmited

patent

Years Active: 1979-2005

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Areas of Expertise:

Photoresist Compositions

Lithographic Printing

Resin Fractionation

Negative Working Overlay

Aqueous Developable

Thermal Adhesive

Electrochemically Treated Plates

Non-Ionic Surfactants

Photosensitive Diazonium Resin

Novel Electrolytes

Pigment Transfer

Image Contrast

23 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6911293 - Photoresist compositions comprising acetals and ketals as solvents (2005-06-28),

2. 6512087 - Fractionation of resins using a static mixer and a liquid-liquid centrifuge (2003-01-28),

3. 6451491 - Aqueous developable negative acting photosensitive composition having improved image contrast (2002-09-17),

4. 6297352 - Method of reducing metal ion content of film-forming resins using a liquid/liquid centrifuge (2001-10-02),

5. 6121412 - Preparation of fractionated novolak resins by a novel extraction (2000-09-19),

6. 6103443 - Photoresist composition containing a novel polymer (2000-08-15),

7. 5928836 - Fractionated novolak resin copolymer and photoresist composition (1999-07-27),

8. 5853947 - Quinonediazide positive photoresist utilizing mixed solvent consisting (1998-12-29),

9. 5432046 - Process for preparing improved lithographic printing plates by (1995-07-11),

10. 5429903 - Water developable, negative working overlay or transfer type diazo color (1995-07-04),

11. 5348834 - Water developable, negative working overlay color proofing system (1994-09-20),

12. 5212041 - Water developable, negative working overlay color proofing system (1993-05-18),

13. 5200291 - Photosensitive diazonium resin, element made therefrom, method of (1993-04-06),

14. 4999266 - Protected color image on substrate with thermal adhesive and (1991-03-12),

15. 4935331 - Pigment transfer to photopolymerizable positive-working imaging system (1990-06-19),

Title: **Stanley F. Wanat: Innovator in Photoresist Technology**

Introduction

Stanley F. Wanat, based in Scotch Plains, NJ, is a notable inventor recognized for his contributions to the field of photoresist technology. With an impressive portfolio of 23 patents, his innovations have significantly impacted the microelectronics industry.

Latest Patents

Among his latest patents is a groundbreaking photoresist composition that incorporates acetals and ketals as solvents. This innovative composition consists of:

a) At least one film-forming resin selected from novolak resins and polyhydroxystyrenes.

b) At least one photoactive compound or photoacid generator.

c) A solvent composition featuring acetals and ketals.

Additionally, another noteworthy patent involves the fractionation of resins using a static mixer and a liquid-liquid centrifuge, designed to produce low molecular weight oligomers of film-forming resins efficiently.

Career Highlights

Stanley has gained extensive experience while working with leading companies, including Hoechst Celanese Corporation and American Hoechst Corporation. His innovative approach and understanding of complex chemical processes have positioned him as a vital contributor to advancements in photoresist technology.

Collaborations

Throughout his career, Stanley has collaborated with distinguished professionals such as M. Dalil Rahman and Thomas N. Gillich. These partnerships have fostered a creative environment, allowing for the exchange of ideas and furthering innovation in the field.

Conclusion

Stanley F. Wanat's extensive patent portfolio and experience in the industry showcase his dedication to innovation in photoresist technology. His contributions continue to pave the way for advancements in microelectronic devices and materials science.

Profile summary based on public USPTO records.