The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 27, 1999

Filed:

Sep. 29, 1997
Applicant:
Inventors:

M Dalil Rahman, Flemington, NJ (US);

Stanley F Wanat, Scotch Plains, NJ (US);

Michelle M Cook, Somerville, NJ (US);

Douglas S McKenzie, Easton, PA (US);

Sunit S Dixit, Flemington, NJ (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
4302701 ; 430311 ; 430905 ; 430168 ; 525491 ; 528144 ; 528501 ; 528203 ;
Abstract

The present invention provides a method for producing a film forming, fractionated novolak resin copolymer exhibiting fast photospeed and superior performance in a photoresist composition. A method is also provided for producing photoresist composition from such a fractionated novolak resin copolymer and for producing semiconductor devices using such a photoresist composition.


Find Patent Forward Citations

Rahman, M. (1999). Fractionated novolak resin copolymer and photoresist composition (U.S. Patent No. 5928836). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5928836

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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