Hoechst Celanese Corporation

Clariant Finance (Bvi) Limited

American Hoechst Corporation

Agfa Corporation

Clariant Finance Lmited

Az Electronic Materials USA Corp.

Stephan J. W. Platzer

Stanley F. Wanat

Stanley F Wanat

M Dalil Rahman

John E Walls

Thomas N Gillich

William J Rozell

Stephan J Platzer

Douglas S McKenzie

Major S Dhillon

Sunit S Dixit

Gerhard Sprintschnik

Mehmet U Yener

Dinesh N Khanna

Ping-Hung Lu

Joseph E Oberlander

Shane Hsieh

Daniel P Aubin

Hong Zhuang

Oliver A Barton

Michelle M Cook

Robert R Plass

Kathryn H Jensen

Dennis A King

Allen W Loveland

John J Kokoszka

Balaji Narasimhan

Zhong Xiang

Douglas Mckenzie

Stephan Jw Platzer

Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a photoresist composition comprising a polycarbonate resin and a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with any of the aforementioned photoresist compositions; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.

Photoresist compositions comprising acetals and ketals as solvents

Disclosed is a method for producing low molecular weight oligomers of a film forming resin, which involves: a) providing a solution of the film forming resin in a first solvent system comprising a photoresist solvent, and optionally a water-soluble organic solvent; b) providing a second solvent system comprising at least one substantially pure C -C alkane and/or at least one aromatic compound having at least one hydrocarbyl substituent and/or water/C -C alcohol mixture; and performing steps c)-e) in the following order: c) mixing the solutions from a) and second solvent system from b) in a static mixer for a time period sufficient for efficient mixing; d) feeding the mixture from c) and second solvent system from b) through two separate inlet ports into a liquid/liquid centrifuge, one of the inlet ports feeding the mixture from c), the second inlet port feeding the second solvent system from b) into said liquid/liquid centrifuge at a feed ratio of the mixture from c) to the second solvent system from b) of from about 10/90 to about 90/10, at a temperature of from about 0&deg; C. up to maximum temperature that is less than the boiling point of the lowest boiling solvent in the first or second solvent system; e) rotating the mixture from step d) inside the liquid/liquid centrifuge at a rotational speed sufficient to separate the mixture from step d) into two separate phases, and then collecting the two separate phases, each from two separate outlet ports, into two separate containers, wherein the heavier phase (H) comprises a fractionated film forming resin comprising higher molecular weight fractions of the film forming resin and the lighter phase (L) comprises low molecular weight oligomers of the film forming resin. The present invention also provides a method for producing a photoresist composition, and method for producing a microelectronic device using the aforementioned fractionated resin or low molecular weight oligomers of the film forming resin.

Fractionation of resins using a static mixer and a liquid-liquid centrifuge

A color ant dispersion having a pigment, a solvent composition of a C -C aliphatic alcohol, a mono- or di-C -C alkylene glycol C -C alkyl ether, or a cyclic ketone; and an aqueous alkaline soluble or swellable polymeric compound which is the reaction product of a hydroxy containing polymer and an anhydride in the presence of a catalytic amount of a tertiary amine catalyst. The pigment and the polymeric compound are present in a high relative weight ratio of from about 0.75:1.25 to about 1.25:0.75. An admixture of the dispersion, a light sensitive component diazonium compound or photopolymerizable composition and an aqueous alkaline soluble or swellable polymeric binder, when coated and dried onto a substrate, forms a photographic element, which when imagewise exposed and developed has an exceptionally high contrast between image and removed non-image areas.

Aqueous developable negative acting photosensitive composition having improved image contrast

The present invention provides a method for reducing the metal ion content of a film-forming resin, said method comprising the steps of: a) providing a solution of the film-forming resin in a water-immiscible solvent system comprising at least one water-immiscible solvent; b) providing a washing solution comprising water or a dilute solution of a water-soluble metal ion chelating agent; c) feeding the solutions from a) and b) through two separate inlet ports into a liquid/liquid centrifuge, one of said inlet ports feeding solution from a), the second inlet port feeding the solution from b) into said liquid/liquid centrifuge at a feed rate ratio of the solution from a) to that from b) from about 10/90 to about 90/10, at a temperature of from about 0&deg; C. up to a maximum temperature that is less than the boiling point of the lowest boiling water-immiscible solvent in the water-immiscible solvent system; and d) rotating the mixture from step c) inside said liquid/liquid centrifuge at a rotational speed sufficient to separate the mixture from step c) into two separate phases, and then collecting the two separate phases, each through a separate outlet port, into two separate containers, wherein the heavier phase (H) comprises the film-forming resin having a reduced metal ion content in the water-immiscible solvent system, with a minor amount of water; and the lighter phase (L) comprises: 1) an aqueous solution of metal ions and a minor amount of a mixture of 2) the water-immiscible solvent system, and 3) the film-forming resin. The present invention also provides for a method for producing a photoresist composition and a method for producing a microelectronic device utilizing a film-forming resin produced by the aforementioned method.

Method of reducing metal ion content of film-forming resins using a liquid/liquid centrifuge

The present invention provides a method for producing a film forming, fractionated novolak resin, by:

Preparation of fractionated novolak resins by a novel extraction

A photoresist composition comprising a film forming resin obtained by condensing a phenol derivative and a substituted diphenyl ether, a photoactive compound, and a solvent. The photoresist composition may also contain an alkali-soluble, film-forming resin, such as a novolak resin. The photoresist of the instant invention improves the photospeed, resolution and thermal stability of the photoresist images.

Photoresist composition containing a novel polymer

The present invention provides a method for producing a film forming, fractionated novolak resin copolymer exhibiting fast photospeed and superior performance in a photoresist composition. A method is also provided for producing photoresist composition from such a fractionated novolak resin copolymer and for producing semiconductor devices using such a photoresist composition.

Fractionated novolak resin copolymer and photoresist composition

A photosensitive positive working photosensitive composition suitable for use as a photoresist, which comprises an admixture of at least one water insoluble, aqueous alkali soluble, film forming novolak resin; at least one o-diazonaphthoquinone photosensitizer; and a photoresist solvent mixture comprising a propylene glycol alkyl ether acetate and 3-methyl-3-methoxy butanol and process for producing such a composition.

Quinonediazide positive photoresist utilizing mixed solvent consisting

Provided herein is a brushgraining process to improve the quality of lithographic printing plate substrate surfaces. In the process, the surface is brushed in an aqueous slurry comprising a mixture of particulates of alumina and quartz in a weight ratio range 95:5 to 5:95, with the particulates being in the size range of 1-20 microns. Such a process surprisingly lessens the number of scratches produced on the substrate surface than when compared to using alumina alone or quartz alone or a mixture of alumina and quartz with particle sizes higher than the range disclosed.

Process for preparing improved lithographic printing plates by

This invention relates to water developable, negative working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process. The invention provides both overlay and transfer type proofing sheets which have good fingerprint resistance.

Water developable, negative working overlay or transfer type diazo color

Water developable, negative working overlay color proofing system

A polymeric compound having the formula ##STR1## wherein x ranges from about 0.05 to about 0.5

Photosensitive diazonium resin, element made therefrom, method of

The invention provides a photographic article having a protected image which comprises

Protected color image on substrate with thermal adhesive and

This invention relates to a method for making a dry transfer, photopolymerizable positive-working imaging system which provides a photopolymerizable layer on a support and a colored layer on a substrate. Upon imagewise exposure of the photopolymerizable layer, subsequent lamination of the colored layer to the photopolymerized layer and peel apart, a colored image is produced due to the preferred adhesion of the colored layer to the nonexposed areas of the photopolymerized layer.

Growing community of inventors

Scotch Plains, NJ, United States of America

Stanley F Wanat