The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2005
Filed:
Apr. 11, 2002
Stanley F. Wanat, Scotch Plains, NJ (US);
Joseph E. Oberlander, Phillipsburg, NJ (US);
Robert R. Plass, Hackensack, NJ (US);
Douglas Mckenzie, Easton, PA (US);
Stanley F. Wanat, Scotch Plains, NJ (US);
Joseph E. Oberlander, Phillipsburg, NJ (US);
Robert R. Plass, Hackensack, NJ (US);
Douglas McKenzie, Easton, PA (US);
Clariant Finance (BVI) Limited, Tortola, VG;
Abstract
Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a photoresist composition comprising a polycarbonate resin and a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with any of the aforementioned photoresist compositions; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.