The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 1999
Filed:
Mar. 25, 1998
Applicant:
Inventors:
M Dalil Rahman, Flemington, NJ (US);
Daniel P Aubin, Oxford, NJ (US);
Dinesh N Khanna, Flemington, NJ (US);
Sunit S Dixit, Flemington, NJ (US);
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ; C08J / ;
U.S. Cl.
CPC ...
4302701 ; 210661 ; 210681 ; 210683 ; 210685 ; 210686 ; 210688 ; 528129 ; 528139 ; 528144 ; 528155 ; 528165 ; 430326 ;
Abstract
A process for producing a water insoluble, aqueous alkali soluble, film forming novolak resin having low metal ions, made by the fractionation of a phenol formaldehyde condensation product, a process for producing a resin a photoresist composition of superior quality containing such novolak resin, and a method for producing a semiconductor device using such photoresist composition.
Rahman, M. (1999). Fractionation of phenol formaldehyde condensate and photoresist (U.S. Patent No. 5976761). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5976761
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile