The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 09, 1999

Filed:

Apr. 30, 1997
Applicant:
Inventors:

Shuji Ding, Branchburg, NJ (US);

Dinesh N Khanna, Flemington, NJ (US);

Ping-Hung Lu, Bridgewater, NJ (US);

Jianhui Shan, High Bridge, NJ (US);

Ralph R Dammel, Flemington, NJ (US);

Dana L Durham, Flemington, NJ (US);

M Dalil Rahman, Flemington, NJ (US);

Iain McCulloch, Basking Ridge, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ; G08F / ; G08F / ;
U.S. Cl.
CPC ...
4302711 ; 525376 ; 5253336 ; 5253277 ; 5253313 ; 5253299 ; 5253285 ; 5253282 ; 526313 ; 526310 ;
Abstract

The present invention relates to a novel polymer suitable for use as an antireflective coating or as an additive in photoresist for absorption of reflected light. The novel polymer comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm and at least one unit that contains no aromatic funtionality. The polymer is soluble in organic solvents, preferrably solvents of low toxicity, or it may be soluble in water, which may additionally contain other water miscible organic solvents.


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