This inventor holds 7 USPTO granted patents. Top assignees: Clariant Finance (Bvi) Limited, Hoechst Celanese Corporation, Clariant International Ltd. Active years: 1993-2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Plainfield, NJ (US) (1993)
- Murray Hill, NJ (US) (1997 - 1998)
- Basking Ridge, NJ (US) (1999 - 2000)
Company Filing History:
3 out of 507 
3 out of 1,194 
1 out of 276 
Years Active: 1993-2000
Title: Iain McCulloch: Innovator in Photoresist Technology
Introduction
Iain McCulloch is a prominent inventor based in Basking Ridge, NJ (US). He has made significant contributions to the field of photoresist technology, holding a total of 7 patents. His work focuses on developing advanced materials that enhance the performance and resolution of photoresists used in various applications.
Latest Patents
Among his latest innovations, McCulloch has developed a 193 nm positive-working photoresist composition. This polymer, when combined with a suitable photoacid generator (PAG), forms a positive working photoresist. The composition features a tartaric polyanhydride backbone, an acetal protected 1,2 diol group, and a fused ring acetal group pendant to the backbone. The unique structure allows for efficient photoacid catalyzed cleavage, resulting in small molecular weight fragments that dissolve readily in an aqueous base developer. This high contrast in solubility enables the production of high-resolution images. Additionally, the fused rings provide etch resistance and can include either an adamantone or norcamphor ring structure.
Another notable patent is the water-soluble negative-working photoresist composition. This polymer, when used with a suitable PAG, forms a negative working water-soluble photoresist. The backbone, such as polyvinyl ether, is linked to an acetal protected β-keto acid group. Upon exposure to radiation, the acetal group undergoes photoacid catalyzed deprotection, yielding a β-keto acid that, upon heating, decarboxylates to form a water-insoluble photoproduct. This process results in a significant change in the polymer's solubility, allowing for fine resolutions at i-line and deep UV wavelengths without the risk of swelling during development.
Career Highlights
Throughout his career, Iain McCulloch has worked with notable companies, including Clariant Finance Limited and Hoechst Celanese Corporation. His expertise in photoresist technology has positioned him as a key figure in the industry, contributing to advancements that have broad applications in electronics and materials science.
Collaborations
McCulloch has collaborated with esteemed colleagues, including Ming Kang and Ralph R. Dammel. These partnerships have fostered innovation and the exchange of ideas, further
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile