Company Filing History:
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1 out of 1,194 Years Active: 1997-2000
Title: Innovations by Inventor Ming Kang
Introduction
Ming Kang is a notable inventor based in Colonia, NJ, who has made significant contributions to the field of photoresist compositions. With a total of four patents to his name, his work focuses on developing advanced materials that enhance the performance and resolution of photoresists used in various applications.
Latest Patents
Ming Kang's latest patents include a 193 nm positive-working photoresist composition and a water-soluble negative-working photoresist composition. The positive-working photoresist is a polymer that, when combined with a suitable photoacid generator (PAG), forms a high-resolution photoresist. This polymer features a tartaric polyanhydride backbone and a unique acetal protected 1,2 diol group, which allows for efficient photoacid catalyzed cleavage. This results in small molecular weight fragments that dissolve readily in an aqueous base developer, enabling the production of high-resolution images. The fused rings in the polymer provide etch resistance and can be made from either an adamantone or norcamphor ring structure.
The water-soluble negative-working photoresist composition is another innovative creation by Kang. This polymer, which includes a polyvinyl ether backbone linked to an acetal protected β-keto acid group, also utilizes commercially available photoacid generators. Upon exposure to radiation, the acetal group undergoes photoacid catalyzed deprotection, leading to a β-keto acid that becomes water insoluble upon heating. This unique reaction allows for fine resolutions at i-line and deep UV wavelengths without the risk of swelling during development.
Career Highlights
Throughout his career, Ming Kang has worked with prominent companies such as Clariant Finance Limited and Clariant International Ltd. His expertise in polymer chemistry and photoresist technology has positioned him as a key figure in the development of advanced materials for the semiconductor industry.
Collaborations
Ming Kang has collaborated with notable individuals in his field, including Iain McCulloch and Anthony J East. These collaborations have further enriched his research and development efforts, leading to innovative solutions in photoresist technology.
Conclusion
Ming Kang's contributions to the field of photoresist compositions demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of polymer chemistry and its applications in technology. Through his work, he