Daisuke Yano

Title: Daisuke Yano: Innovator in Plasma Processing Technology

Introduction

Daisuke Yano is a prominent inventor based in Minami-Alps, Japan. He has made significant contributions to the field of plasma processing, holding a total of 10 patents. His innovative work focuses on enhancing plasma etching methods and apparatuses, which are crucial in various technological applications.

Latest Patents

One of Yano's latest patents is a plasma processing apparatus and method. This method involves executing an etching process that supplies an etching gas into a process container, where a target substrate is supported on a second electrode. The process includes applying RF power for plasma generation and ion attraction, transforming the etching gas into plasma to etch the target substrate. Additionally, the etching process applies a negative DC voltage to a first electrode, increasing the self-bias on the electrode. Another notable patent is a plasma etching apparatus that features an upper and lower electrode, generating plasma from a process gas to perform etching on a wafer. This apparatus includes a cooling ring and a correction ring, with a variable DC power supply connected to the correction ring to attract ions in the plasma and maintain optimal temperatures.

Career Highlights

Daisuke Yano has worked with notable companies, including Tokyo Electron Limited. His experience in these organizations has allowed him to refine his expertise in plasma processing technologies and contribute to advancements in the field.

Collaborations

Yano has collaborated with esteemed colleagues such as Akira Koshiishi and Masaru Sugimoto. These partnerships have fostered innovation and development in plasma processing techniques.

Conclusion

Daisuke Yano's contributions to plasma processing technology through his patents and collaborations highlight his role as a leading inventor in this field. His work continues to influence advancements in various technological applications.