Cuc Kim Huynh

This inventor holds 27 USPTO granted patents, primarily in Chemical Mechanical Polishing. Top assignee: International Business Machines Corporation. Active years: 1998-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Cuc Kim Huynh. Retrieved from https://idiyas.com/inventor/cuc-kim-huynh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 27

% Patents Active = 74.1

Average Co-Inventor Count = 4.6

ph-index = 11

Forward Citations = 341(Granted Patents)

Location History:

Jehrico, VT (US) (1998)
Jericho, VT (US) (1998 - 2012)

Company Filing History:

27 out of 166,351

International Business Machines Corporation

patents

Years Active: 1998-2012

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Areas of Expertise:

Chemical Mechanical Polishing

Photoresist Trimming

Semiconductor Processing

Chrome Etching

CMP Apparatus

Wafer Cleaning

Slurry Distribution

Device Parameter Homogenization

Post CMP Cleaning

Sidewall Spacers

Polishing Pad Conditioner

Residual Metal Removal

27 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8301288 - Optimized scheduling based on sensitivity data (2012-10-30),

2. 7960288 - Photoresist trimming process (2011-06-14),

3. 7955988 - Photoresist trimming process (2011-06-07),

4. 7754394 - Method to etch chrome for photomask fabrication (2010-07-13),

5. 7304000 - Photoresist trimming process (2007-12-04),

6. 7014959 - CD uniformity of chrome etch to photomask process (2006-03-21),

7. 6599173 - Method to prevent leaving residual metal in CMP process of metal interconnect (2003-07-29),

8. 6468135 - Method and apparatus for multiphase chemical mechanical polishing (2002-10-22),

9. 6432823 - Off-concentric polishing system design (2002-08-13),

10. 6387810 - Method for homogenizing device parameters through photoresist planarization (2002-05-14),

11. 6352596 - Post CMP cleaning method using a brush cleaner with torque monitor (2002-03-05),

12. 6300246 - Method for chemical mechanical polishing of semiconductor wafer (2001-10-09),

13. 6299515 - CMP apparatus with built-in slurry distribution and removal (2001-10-09),

14. 6287178 - Wafer carrier rinsing mechanism (2001-09-11),

15. 6269510 - Post CMP clean brush with torque monitor (2001-08-07),

Title: Innovations of Cuc Kim Huynh in Optimization and Photoresist Technology

Introduction

Cuc Kim Huynh is a notable inventor based in Jericho, Vermont, with an impressive portfolio of 27 patents. His work primarily focuses on innovative solutions in scheduling optimization and photoresist technology, significantly contributing to the field of electronics manufacturing.

Latest Patents

Two of Cuc Kim Huynh's most recent patents highlight his expertise and creativity:

1. **Optimized Scheduling Based on Sensitivity Data**: This invention presents a scheduling optimizer system designed to analyze devices for sensitivities, such as electrostatic discharge (ESD) sensitivities. It not only allows for the modification of the assembly unit's floor schedule based on sensitivity data but also enhances the overall performance of the assembly unit during device operation.

2. **Photoresist Trimming Process**: This patent introduces a photoresist trimming gas compound capable of selectively removing resist foot or scum from the lower portions of photoresist sidewalls. The compound also strengthens the photoresist by hardening the upper surface, thus providing durability during the dry etching process utilized after trench formation in photoresist.

Career Highlights

Cuc Kim Huynh is currently associated with International Business Machines Corporation (IBM), where he continues to innovate within the technology sector. His career at IBM has been marked by sustained contributions to improving manufacturing processes and product performance through his patented inventions.

Collaborations

Throughout his career, Cuc has collaborated with esteemed colleagues such as Douglas P. Nadeau and Gary Joseph Beardsley. These collaborations have played a pivotal role in the development of his inventions, fostering a collaborative spirit that drives innovation within the team.

Conclusion

Cuc Kim Huynh exemplifies the essence of innovation through his patents that address critical challenges in technology and manufacturing. His continued work at IBM, along with his collaborative efforts, positions him as a key player in advancing electronic manufacturing processes and technologies.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]