Chung-Hao Chang

Title: Chung-Hao Chang: Innovator in Semiconductor Manufacturing

Introduction

Chung-Hao Chang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 9 patents. His innovative approaches have advanced the technology used in semiconductor devices, particularly in lithography and developing methods.

Latest Patents

One of his latest patents is a method of manufacturing semiconductor devices using a photomask. This method involves performing an EUV lithography operation using an EUV mask on a photo resist layer formed over a semiconductor substrate. After the lithography operation, the EUV mask is unloaded and placed under reduced pressure, where it is heated at a controlled temperature before being stored. Another notable patent is a developing method that includes rotating a wafer and dispensing a developer solution and rinse solution at different speeds. This method enhances the efficiency of the developing process in semiconductor fabrication.

Career Highlights

Chung-Hao Chang has worked with leading companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company Ltd. and Fitipower Integrated Technology, Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Chung-Hao has collaborated with notable professionals in his field, including Li-Kong Turn and Yi-Rem Chen. These collaborations have fostered innovation and have been instrumental in the development of new technologies in semiconductor manufacturing.

Conclusion

Chung-Hao Chang's contributions to semiconductor manufacturing through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the future of semiconductor technology.