The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2017

Filed:

Feb. 25, 2014
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Yi-Rem Chen, Taipei, TW;

Ming-Shane Lu, Zhubei, TW;

Chung-Hao Chang, Hsinchu, TW;

Jui-Ping Chuang, Hsinchu, TW;

Li-Kong Turn, Taichung, TW;

Fei-Gwo Tsai, Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 9/34 (2006.01); G03F 7/30 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G03F 7/3021 (2013.01); H01L 21/6715 (2013.01); H01L 21/67051 (2013.01);
Abstract

A tool and a method of developing are provided. In various embodiments, the method of developing includes rotating a wafer at a first rotating speed. The method further includes dispensing a developer solution onto the wafer at the first rotating speed by a first nozzle above the wafer, wherein the first nozzle moves back and forth along a path during dispensing the developer solution. The method further includes rotating the wafer at a second rotating speed to spread the developer solution onto the wafer uniformly. The method further includes dispensing a rinse solution onto the wafer at the second rotating speed by a second nozzle above the wafer.


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