Chung Foong Tan

Title: Innovations of Chung Foong Tan

Introduction

Chung Foong Tan is a notable inventor based in Ballston Spa, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of seven patents. His work focuses on enhancing the performance of field effect transistors (FETs) through innovative structures and methods.

Latest Patents

One of his latest patents is titled "Structure with different stress-inducing isolation dielectrics for different polarity FETs." This invention describes a structure and method that utilize different stress-inducing isolation dielectrics to induce appropriate stresses in both p-type and n-type FETs, thereby improving their performance. The structure includes a first stress-inducing isolation dielectric that surrounds and contacts a first active region for a p-type field effect transistor (PFET), and a second stress-inducing isolation dielectric that surrounds and contacts a second active region for an n-type field effect transistor (NFET). The differing types of stress induced by these dielectrics enhance the performance of both types of FETs.

Another significant patent is related to "N-well resistor." This disclosure pertains to semiconductor structures, specifically n-well resistors and their manufacturing methods. The structure consists of a substrate composed of a N-well implant region and a deep N-well implant region, along with a plurality of shallow trench isolation regions extending into both the N-well implant region and the deep N-well implant region.

Career Highlights

Chung Foong Tan has worked with prominent companies in the semiconductor industry, including GlobalFoundries Inc. and GlobalFoundries U.S. Inc. His experience in these organizations has allowed him to contribute to cutting-edge technologies and innovations in the field.

Collaborations

Throughout his career, Chung has collaborated with talented individuals such as Hui Zang and Guowei Xu. These collaborations have further enriched his work and contributed to the advancements in semiconductor technology.

Conclusion

Chung Foong Tan's innovative contributions to semiconductor technology, particularly in the area of field effect transistors, have established him as a significant figure in the industry. His patents reflect a commitment to improving electronic performance through advanced engineering solutions.