Chun-Hsiung Wang

Title: The Innovations of Chun-Hsiung Wang

Introduction

Chun-Hsiung Wang is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work has been instrumental in advancing the capabilities of semiconductor devices.

Latest Patents

Wang's latest patents focus on innovative semiconductor devices and methods for their fabrication. One notable patent describes a semiconductor device that includes a gate structure extending along a first direction on a substrate. This device features a first doped region adjacent to one side of the gate structure and a second doped region adjacent to the other side. Additionally, it incorporates fin-shaped structures that enhance the device's performance. Another patent outlines a similar semiconductor device, emphasizing the differences in the number of fin-shaped structures covered by the gate structure compared to those overlapping the doped regions.

Career Highlights

Chun-Hsiung Wang is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His role involves research and development, where he applies his expertise to create cutting-edge technologies. Wang's contributions have not only advanced his company but have also had a lasting impact on the semiconductor field.

Collaborations

Wang has collaborated with several talented individuals in his field, including Yu-Ting Li and Wu-Sian Sie. These collaborations have fostered innovation and have led to the successful development of various semiconductor technologies.

Conclusion

Chun-Hsiung Wang's work in semiconductor technology exemplifies the spirit of innovation. His patents and collaborations continue to shape the future of the industry, making him a notable figure in the realm of inventions.