Albany, NY, United States of America

Christopher Netzband

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):

Title: Christopher Netzband: Innovator in Wet Atomic Layer Etching

Introduction

Christopher Netzband, based in Albany, NY, is a notable inventor recognized for his contributions to the field of atomic layer etching. With a focus on developing advanced methods for etching copper, his work has significant implications for semiconductor manufacturing.

Latest Patents

Netzband holds a patent titled "Methods for Wet Atomic Layer Etching of Copper." This patent discloses a novel wet atomic layer etch (ALE) process specifically designed for copper. The invention involves various embodiments that utilize innovative etch chemistries to achieve a highly selective etching process with monolayer precision. This advancement represents a critical improvement in the precision etching capabilities necessary for modern electronics.

Career Highlights

Christopher Netzband is associated with Tokyo Electron Limited, a prominent company in the semiconductor and electronics manufacturing sector. His research and inventions are pivotal in enhancing the efficiency of etching processes, which are crucial for the production of cutting-edge electronic devices. His expertise and innovative solutions reflect a commitment to improving technology in the semiconductor industry.

Collaborations

Among his esteemed colleagues are Paul Abel and Jacques Faguet, with whom he shares a collaborative spirit in research and innovation. Their combined efforts contribute to advancing the field of semiconductor processes, emphasizing the importance of teamwork and shared knowledge in driving technological progress.

Conclusion

Christopher Netzband exemplifies the spirit of innovation in the field of atomic layer etching, bringing significant advancements to the semiconductor industry through his research and patents. His work not only showcases his individual talent but also highlights the collaborative efforts essential in pushing the boundaries of technology. As he continues to refine etching processes, Netzband's contributions will undoubtedly impact the future of electronics.

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