The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2025
Filed:
Oct. 04, 2022
Tokyo Electron Limited, Tokyo, JP;
Sergey Voronin, Albany, NY (US);
Qi Wang, Albany, NY (US);
Christopher Netzband, Albany, NY (US);
Gabriel Gibney, Albany, NY (US);
Sang Cheol Han, Albany, NY (US);
Peter Biolsi, Albany, NY (US);
Arkalgud Sitaram, Albany, NY (US);
Christophe Vallee, Albany, NY (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method of etching a metal includes performing at least two cycles of an etch process. A cycle of the etch process includes: performing a surface modification on an exposed surface of a metal layer over a substrate, performing a hydrogen treatment on the metal layer, and performing a cleaning treatment on the metal layer. The hydrogen treatment forms a layer of reaction products on the metal layer. The cleaning treatment removes the layer of reaction products.