Ching-Long Tsai

Title: Innovations of Ching-Long Tsai

Introduction

Ching-Long Tsai is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on innovative methods that enhance the manufacturing processes of semiconductor devices.

Latest Patents

One of his latest patents is titled "Method of cleaning post-etch residues on a copper line." This method involves providing a copper line divided into a first region and a second region. A dielectric layer is formed on the copper line, which is then etched to create openings. The number of openings in the first region exceeds that in the second region. During the etching process, a potential difference is established between the two regions of the copper line. The final step involves cleaning both the dielectric layer and the copper line using a solution with a specific pH value that relates to the potential difference.

Another notable patent is "Semiconductor device and manufacturing method thereof." This method outlines the steps for manufacturing a semiconductor device, starting with the formation of two gate stack layers on a semiconductor substrate. Each gate stack layer includes a top surface and two side surfaces. A conductive material layer is deposited to cover these surfaces, followed by a cap layer. The cap layer and the conductive material layer above the top surface are then removed, leaving the cap layer adjacent to the side surfaces.

Career Highlights

Ching-Long Tsai is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His innovative approaches have contributed to advancements in semiconductor manufacturing techniques.

Collaborations

He has collaborated with notable coworkers, including Cheng-Yuan Hsu and Chi Ren, who have also made significant contributions to the field.

Conclusion

Ching-Long Tsai's work exemplifies the spirit of innovation in semiconductor technology. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing, paving the way for future advancements in the industry.