Portland, OR, United States of America

Chin-Chang Cheng

USPTO Granted Patents = 14 

Average Co-Inventor Count = 3.0

ph-index = 8

Forward Citations = 204(Granted Patents)


Location History:

  • Hillsboro, OR (US) (2004 - 2006)
  • Portland, OR (US) (2006 - 2011)

Company Filing History:


Years Active: 2004-2011

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14 patents (USPTO):Explore Patents

Title: The Innovative Mind of Chin-Chang Cheng

Introduction

Chin-Chang Cheng is a prominent inventor based in Portland, Oregon, known for his significant contributions to the field of nanotechnology and semiconductor manufacturing. With an impressive portfolio of 14 patents, Cheng continues to push the boundaries of innovation at Intel Corporation, where he applies his expertise to develop cutting-edge technologies.

Latest Patents

Among Cheng's latest patents is his work on "Nanotube growth and device formation." This invention discloses an apparatus and method for forming catalyst particles that facilitate the growth of nanotubes. The process allows for the creation of particles with varying diameters, which are deposited onto a substrate. These particles, once deposited, restrict mobility, enabling the growth of nanotubes and nanotube portions. Notably, these portions can vary in diameter along the length of the nanotube, showcasing the versatility of this innovative technique.

Another significant patent introduced by Cheng is the "Method of making a bottomless via." This method describes a procedure for forming a copper interconnect by creating an opening in a dielectric layer on a substrate, followed by the formation of a barrier layer and a seed layer made of a noble metal copper alloy. This innovative approach makes it possible to achieve efficient interconnections in semiconductor devices.

Career Highlights

Chin-Chang Cheng's career at Intel Corporation has been marked by his dedication to advancing semiconductor technologies. His patents reflect his commitment to enhancing performance and efficiency in device manufacturing, making substantial contributions to the field.

Collaborations

Throughout his career, Cheng has collaborated with esteemed colleagues, including Valery M Dubin and Makarem A Hussein. These collaborations have further enriched the innovation landscape at Intel, paving the way for continued advancements in technology.

Conclusion

Chin-Chang Cheng stands out as a distinguished inventor whose innovations in nanotechnology and semiconductor manufacturing are shaping the future. With a total of 14 patents to his name, his work at Intel Corporation exemplifies the intersection of creativity and technological advancement, inspiring future generations of inventors and researchers.

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