The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2006

Filed:

Jun. 26, 2003
Applicants:

Hok-kin Choi, San Jose, CA (US);

Vani Thirumala, San Jose, CA (US);

Valery Dubin, Portland, OR (US);

Chin-chang Cheng, Portland, OR (US);

Ting Zhong, Tigard, OR (US);

Inventors:

Hok-Kin Choi, San Jose, CA (US);

Vani Thirumala, San Jose, CA (US);

Valery Dubin, Portland, OR (US);

Chin-chang Cheng, Portland, OR (US);

Ting Zhong, Tigard, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 18/31 (2006.01); B05D 1/18 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and method for storing a solution containing a subset of a group consisting of a metal ion, a complexing agent, an ammonium salt, and a strong base and then nearer to a time of use in an electroless deposition process, using the solution to form an electroless deposition solution containing the entire group. In one embodiment of the invention, the metal ion includes a cobalt ion, the complexing agent includes citric acid, the ammonium salt includes ammonium chloride, and the strong base includes tetramethylammonium hydroxide.


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