Taichung, Taiwan

Chih-Yun Chin

Average Co-Inventor Count = 7.1

ph-index = 2

Forward Citations = 11(Granted Patents)

Forward Citations (Not Self Cited) = 5(Sep 21, 2024)


Years Active: 2018-2025

where 'Filed Patents' based on already Granted Patents

12 patents (USPTO):

Title: Innovations of Chih-Yun Chin in Semiconductor Technology

Introduction

Chih-Yun Chin is an influential inventor based in Taichung, Taiwan, renowned for his contributions to semiconductor technology. With a prolific portfolio of 11 patents, he is at the forefront of innovations that enhance the efficiency and performance of semiconductor devices.

Latest Patents

Chih-Yun Chin's latest patents include groundbreaking technologies such as the "Low Ge Isolated Epitaxial Layer Growth Over Nano-Sheet Architecture Design for RP Reduction." This innovation describes a nano-FET (Field Effect Transistor) that incorporates an epitaxial source/drain region, highlighting the integration of nanostructures to optimize device construction.

Another notable patent is the "Supportive Layer in Source/Drains of FinFET Devices." This semiconductor structure demonstrates an advanced design where a fin on a substrate is equipped with a unique supportive layer within the source/drain region, aimed at optimizing electrical performance by varying its material properties unique to those of both the bottom and top layers.

Career Highlights

Chih-Yun Chin is currently affiliated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work directly influences the ongoing evolution of FinFET technology, which is critical for modern electronics.

Collaborations

Among his esteemed colleagues are Chii-Horng Li and Yen-Ru Lee, who contribute to the dynamic research environment at their company. Their collaboration fosters a synergistic approach to tackling complex challenges in semiconductor design and manufacturing.

Conclusion

Chih-Yun Chin stands as a significant figure in the realm of semiconductor innovations. His patents not only reflect cutting-edge advancements but also lay the groundwork for future technologies in the semiconductor market. As the industry continues to evolve, Chin's contributions highlight the ongoing importance of innovative thinking in engineering and technology development.

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