Chih-Wei Chang

Title: Invention Spotlight: Chih-Wei Chang's Innovative Patents

Introduction:

In the fast-paced world of technology and innovation, individuals like Chih-Wei Chang play a vital role in advancing and shaping industries. With a strong background in semiconductor technology, Chang has garnered an impressive number of patents and made significant contributions to the field. This article sheds light on Chih-Wei Chang's latest patents, career highlights, and noteworthy collaborations.

Latest Patents:

Chih-Wei Chang has a remarkable portfolio of 128 patents, showcasing his expertise and inventiveness. Two of his recent patents are particularly noteworthy:

1. Selective Dual Silicide Formation:

This patent introduces techniques that allow for the selective formation of different metal silicide layers in p-type and n-type source/drain regions. By selectively forming the metal silicide layer, the patent aims to reduce contact resistance in both p-type and n-type regions, resulting in improved performance and reduced power consumption.

2. Liner-Free Conductive Structures:

In this patent, Chang presents a method for forming liner-free or barrier-free conductive structures. By eliminating the need for a liner layer, the process becomes more efficient and cost-effective. The patent outlines a process of forming a liner-free conductive structure, applying a heat treatment, and subsequently removing the additional cobalt layer, allowing for more streamlined manufacturing processes.

Career Highlights:

Chih-Wei Chang has an extensive career working with prominent semiconductor companies. Here are two notable highlights:

1. Taiwan Semiconductor Manufacturing Company Limited (TSMC):

Chang has made significant contributions during his tenure at TSMC, a leading global semiconductor foundry. His innovative patents have helped bolster the company's reputation for cutting-edge technology and advancements in semiconductor manufacturing processes.

2. Realtek Semiconductor Inc.:

Chang also contributed his expertise to Realtek Semiconductor Inc., a renowned fabless semiconductor company specializing in networking and multimedia ICs. His work likely contributed to advancements in these areas, further solidifying Realtek's position as a key player in the semiconductor industry.

Collaborations:

In his remarkable journey, Chih-Wei Chang has collaborated with several talented individuals. Two notable coworkers include:

1. Sheng-Hsuan Lin:

Lin, a colleague of Chang, has likely shared expertise and worked alongside him on various innovative projects. Their collaboration may have resulted in synergistic advancements in semiconductor technology.

2. Yu-Hung Lin:

Yu-Hung Lin, another associate of Chang, has likely played a significant role in shaping their collective contributions. Collaborations between skilled professionals like Chang and Lin often lead to groundbreaking developments within the industry.

Conclusion:

Chih-Wei Chang's impressive inventiveness and expertise have resulted in a vast patent portfolio that demonstrates his contributions to semiconductor technology. Through his work at reputable companies such as TSMC and Realtek Semiconductor Inc., Chang has made a lasting impact on the field. Collaborating with accomplished individuals like Sheng-Hsuan Lin and Yu-Hung Lin further highlights the power of teamwork and shared knowledge. As technology continues to evolve, inventors like Chih-Wei Chang will undoubtedly continue to shape the future of the semiconductor industry.