Chih-Jen Yu

Title: Chih-Jen Yu: Innovator in Semiconductor Technology

Introduction

Chih-Jen Yu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving manufacturing processes and device performance in the semiconductor industry.

Latest Patents

One of his latest patents is titled "Method and apparatus for improved wafer coating." This invention describes a semiconductor device that includes a metallization layer, a passivation layer above the metallization layer, a copper redistribution layer on the passivation layer, a second passivation layer on the copper redistribution layer, and a polyimide layer over the second passivation layer. Notably, the polyimide layer and the second passivation layer feature a continuous gap that exposes a portion of the copper redistribution layer. Another significant patent is "Treatment to interface between metal film and BARC or photoresist." This patent discloses a method of manufacturing a semiconductor device, where a metallic layer is formed over a substrate, surface-treated with an alkaline solution, and subsequently coated with a bottom anti-reflective coating (BARC) layer.

Career Highlights

Chih-Jen Yu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative approaches and patents have contributed to advancements in semiconductor manufacturing techniques.

Collaborations

Throughout his career, Chih-Jen Yu has collaborated with notable colleagues, including Keh-Wen Chang and Chun-Hung Lin. Their combined expertise has fostered a productive environment for innovation and development in semiconductor technologies.

Conclusion

Chih-Jen Yu's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor manufacturing processes.